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193nm Deep Ultraviolet
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193nm is a core deep ultraviolet (DUV) wavelength band, predominantly generated by argon fluoride (ArF) excimer lasers at a wavelength of 193.368nm with a photon energy of approximately 6.4eV. It achieves precision processing through photochemical effects and is widely used in semiconductor lithography, precision optics, and medical fields. Optical crystals and components: calcium fluoride (CaF₂) achieves a 193nm transmittance of >99.3%/cm with a laser damage threshold of 7 J/cm², compatible with lithography machine objectives; certain deep ultraviolet crystals/MgF₂ crystals are used in 193nm polarizing prisms (Wollaston/Rochon prisms), meeting requirements for high extinction ratio and transmittance.
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193nm AR lenses
193nm AR lenses are deep ultraviolet (DUV) anti-reflection lenses specifically designed to achieve ultra-low reflectance and high laser damage threshold at the 193nm (ArF excimer laser) wavelength, widely used in advanced applications such as semiconducto
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193nm HR lenses
193nm HR lenses are deep ultraviolet (DUV) high-energy, high-reflectance optical components. Their core function is to achieve ultra-high reflectance and extremely high laser damage threshold at the 193nm (ArF excimer laser) wavelength through multilayer
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193nm PR lenses
193nm PR (Polarization Rotator) lenses are deep ultraviolet (DUV) polarization state control components. Their core function is to precisely rotate the polarization direction at the 193nm (ArF excimer laser) wavelength, serving as key components for polar
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193nm Glan Polarizer lenses
193nm Glan Polarizer lenses
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